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A proposed new standard being developed by ASTM International Committee B09 on Metal Powders and Metal Powder Products offers a solution to the challenge of handling and characterizing very fine powders. Subcommittee B09.02 on Base Metal Powders is developing the proposed standard, WK13023 , Test Method for Determination of Tap Density of Metallic Powders by a Constant Volume Measuring Method. …
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Conventionally processed powder metallurgy materials often exhibit open microporosity at the surface. While it is a natural part of the process, this microporosity can affect the measurement of surface finishes. To cover this and other issues that arise from measuring the surface finish of powder metallurgy, ASTM International Committee B09 on Metal Powders and Metal Powder Products has developed…
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A proposed new standard currently being developed by ASTM International Committee F01 on Electronics will prove to be useful to the tantalum sputtering target industry. The proposed standard, WK9490, Test Method for Reporting Crystallographic Orientation of Sputtering Target Materials, is under the jurisdiction of Subcommittee F01.17 on Sputter Metallization. "The tantalum sputtering target…
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ASTM International Committee F01 on Electronics is currently developing a proposed new standard that will provide uniformity in the values reported for oxygen content in aluminum alloys used for sputtering targets in the manufacture of integrated circuits. The proposed standard, WK9120, Determination of Oxygen in High Purity Aluminum and Alloys in High Purity Aluminum Base by Inert Gas Fusion…
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ASTM International Subcommittee F01.11 has recently changed its name from Quality and Hardness Assurance to Nuclear and Space Radiation Effect. The subcommittee is under the jurisdiction of ASTM International Committee F01 on Electronics. According to William Alfonte, chair of F01.11, the title of the subcommittee has been changed to more accurately reflect the scope of its current and future…
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ASTM International Committee F01 on Electronics is currently seeking participation for any interested parties in the development of a proposed new standard, WK6499, Test Method for Determining Sputtering Target Utilization. The proposed new standard is under the jurisdiction of Subcommittee F01.17 on Sputter Metallization. Target utilization is the amount of target material that is available for…